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VIISta® High Energy
Varian Semiconductor offers the only single-wafer high energy implanters available on the market today. Our high energy VIISta series features true-zero degree implant and low contamination. VIISta high energy systems offer an advantage for semiconductor manufacturers that need increased device packing density in high-performance devices.

The VIISta high energy implanters feature:
  • Outstanding process accuracy
  • Highest productivity
  • Excellent uniformity
  • Outstanding angle control
  • Medium-current back-up flexibility
Varian Semiconductor’s high energy products cover:
  • Retrograde well
  • Triple well
  • Buried layers
  • Most medium current applications
Our high energy implanters are based on a common platform, providing customers with flexibility in managing overall bay productivity, resulting in:
  • Decreased time to first silicon
  • Greater productivity across all applications
  • Highest industry throughput
  • Precise beam steering and tilt accuracy
  • Flexible product mix changes
  • Cost-effective training
  • Increased return on investment


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